Atomic Layer Deposition for 2D materials and devices

Thursday 14 September 2017 - 3.30pm
 

 Dr Knoops and Dr Neumaier discuss how ALD can be used to grow various materials such as dielectrics on 2D materials and how it can also be used to directly (or indirectly) grow other materials.

The webinar will comprise of two talks, with a Q&A session at the end:

Presenter
Dr Harm Knoops
Atomic Scale Segment Specialist
Oxford Instruments Plasma Technology
Presenter
Daniel Neumaier
Head of Graphene Group
Amo GmbH

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